Electromigration in short Al lines studied by high-resolution resistance measurement
Conference Paper
(1997)
Author(s)
A.H. Verbruggen (TU Delft - QN/Fysics of NanoElectronics)
MJC van de Homberg (TU Delft - QN/Fysics of NanoElectronics)
LC Jacobs (External organisation)
AJ Kalkman (TU Delft - QN/Fysics of NanoElectronics)
JR Kraayeveld (External organisation)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:7bdb4bc9-774b-4be6-ac9a-3dd885294e81
More Info
expand_more
expand_more
Publication Year
1997
Research Group
QN/Fysics of NanoElectronics
Pages (from-to)
255-266
No files available
Metadata only record. There are no files for this record.