Electromigration in short Al lines studied by high-resolution resistance measurement

Conference paper (1997)

Authors

A.H. Verbruggen QN/Fysics of NanoElectronics

MJC van de Homberg QN/Fysics of NanoElectronics

LC Jacobs External organisation

AJ Kalkman QN/Fysics of NanoElectronics

JR Kraayeveld External organisation

S Radelaar OLD Metals Processing, Microstructures and Properties

Research Group

QN/Fysics of NanoElectronics

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Published Date

1997

Language

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Research Group

QN/Fysics of NanoElectronics