Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics

Journal article (1996)

Authors

F Bijkerk External organisation
LA Shmaenol External organisation
T Zijlstra QN/Kavli Nanolab Delft - AS
E Louis External organisation
HJ Voorma QN/Fysics of NanoElectronics
NB Koster External organisation
FA van Goor External organisation
J van Spijker External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
J Romijn QN/Kavli Nanolab Delft - AS
BAC Rousseeuw QN/Kavli Nanolab Delft - AS
Research Group
QN/Fysics of NanoElectronics
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Published Date

1996

Language

Undefined/Unknown

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Research Group

QN/Fysics of NanoElectronics