Enhanced Thermal Management of a 1.2 kV SiC MOSFET Half-Bridgec Fan-Out Panel-Level Packaging with Nanocopper Sintering Die-Attachment

Conference Paper (2025)
Author(s)

Wei Chen (Fudan University)

Junwei Chen (Fudan University)

Chao Gu (Fudan University)

Tiancheng Tian (Fudan University)

Xueiun Fan (Lamar University College of Engineering)

Kouchi Zhang (TU Delft - Electronic Components, Technology and Materials)

Jiajie Fan (Fudan University)

Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1109/ECTC51687.2025.00084
More Info
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Publication Year
2025
Language
English
Research Group
Electronic Components, Technology and Materials
Bibliographical Note
Green Open Access added to TU Delft Institutional Repository as part of the Taverne amendment. More information about this copyright law amendment can be found at https://www.openaccess.nl. Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.@en
Pages (from-to)
473-480
ISBN (print)
979-8-3315-3933-7
ISBN (electronic)
979-8-3315-3932-0
Reuse Rights

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Abstract

Sintered nano-copper (Cu) improves the thermal performance of SiC MOSFET Fan-Out Panel-Level Packaging (FOPLP), a widely adopted method for miniaturizing electronic systems and modules. This study presented, for the first time, the prototyping and characterization of a 1.2 kV SiC MOSFET FOPLP half-bridge power module using sintered nano-Cu die attachment (FOPLPCu), and compared it with a reference module using conductive Ag adhesive interconnects (FOPLP_Ag). Thermal, mechanical, and electrical co-simulations proved that FOPLPCu exhibited superior performances with lower thermal resistance, power loop parasitic inductance, and thermal deformation, achieving values of 0.14 °C/W (with double-sided cooling), 3.15 nH (@100 kHz), and 9.05e-5 m, respectively. In contrast, FOPLP_Ag showed higher values of 0.24 °C/W, 3.27 nH, and 1.04e-4 m. It is worth noting that due to the higher elastic modulus of sintered nano Cu, FOPLPCu experienced increased thermal stress. The internal structure analysis of the packaged devices, conducted using CSAM, showed that both FOPLPCu and FOPLP_Ag had well-formed interconnections, with no signs of delamination in the EMC, RDL, or interconnect layers. Thermal testing showed that FOPLPCu achieved a single-side thermal resistance of 1.95 °C/W, representing a 22% improvement compared to FOPLP_Ag's 2.5 °C/W. Electrical testing further demonstrated that FOPLPCu had lower on-state resistance compared to FOPLP_Ag, while maintaining comparable breakdown voltage, threshold voltage, and body diode forward voltage drop.

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