We investigate the disorder properties of two-dimensional hole gases in Ge/SiGe heterostructures grown on Ge wafers, using thick SiGe barriers to mitigate the influence of the semiconductor-dielectric interface. Across several heterostructure field effect transistors, we measure an average maximum mobility of ( 4.4 ± 0.2 ) × 10 6 cm 2 / Vs at a saturation density of ( 1.72 ± 0.03 ) × 10 11 cm − 2 , corresponding to a long mean free path of ( 30 ± 1 ) μ m . The highest measured mobility is 4.68 × 10 6 cm 2 / Vs . We identify uniform background impurities and interface roughness as the dominant scattering mechanisms limiting mobility in a representative device, and we evaluate a percolation-induced critical density of ( 4.5 ± 0.1 ) × 10 9 cm − 2 . This low-disorder heterostructure, according to simulations, may support the electrostatic confinement of holes in gate-defined quantum dots.@en

Hole gases in planar germanium can have high mobilities in combination with strong spin-orbit interaction and electrically tunable g factors, and are therefore emerging as a promising platform for creating hybrid superconductor-semiconductor devices. A key challenge towards hybrid Ge-based quantum technologies is the design of high-quality interfaces and superconducting contacts that are robust against magnetic fields. In this work, by combining the assets of aluminum, which provides good contact to the Ge, and niobium, which has a significant superconducting gap, we demonstrate highly transparent low-disordered JoFETs with relatively large ICRN products that are capable of withstanding high magnetic fields. We furthermore demonstrate the ability of phase-biasing individual JoFETs, opening up an avenue to explore topological superconductivity in planar Ge. The persistence of superconductivity in the reported hybrid devices beyond 1.8 T paves the way towards integrating spin qubits and proximity-induced superconductivity on the same chip.

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