LH
L. Han
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3 records found
1
Journal article
(2016)
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RA Vasudevan, Zaid Thanawala, AHM Smets, L Han, Hairen Tan, Thom Buijs, D Deligiannis, P Perez Rodriguez, IA Digdaya, WA Smith, M Zeman
A hybrid tandem solar cell consisting of a thin-film, nanocrystalline silicon top junction and a siliconheterojunction bottom junction is proposed as a supporting solar cell for photoelectrochemical applications.Tunneling recombination junction engineering is shown to be an important consideration indesigning this type of solar cell. The best hybrid cell produced has a spectral utilization of 30.6 mA cm2a JSC of 14 mA cm2, a VOC of 1.1 V, a fill factor of 0.67 and thus an efficiency of 10.3%. A high solar-tohydrogenefficiency of 7.9% can be predicted when using the hybrid cell in conjunction with current a-SiCphotocathode technology.
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A hybrid tandem solar cell consisting of a thin-film, nanocrystalline silicon top junction and a siliconheterojunction bottom junction is proposed as a supporting solar cell for photoelectrochemical applications.Tunneling recombination junction engineering is shown to be an important consideration indesigning this type of solar cell. The best hybrid cell produced has a spectral utilization of 30.6 mA cm2a JSC of 14 mA cm2, a VOC of 1.1 V, a fill factor of 0.67 and thus an efficiency of 10.3%. A high solar-tohydrogenefficiency of 7.9% can be predicted when using the hybrid cell in conjunction with current a-SiCphotocathode technology.
Journal article
(2015)
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Rui Liu, Lihao Han, Zhuangqun Huang, Ivonne M. Ferrer, Arno Smets, Miro Zeman, Bruce S. Brunschwig, Nathan S. Lewis
Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.
...
Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.