Interferometer for extreme-UV Lithograpgy mirrors aims for 0.1-nm accuracy

Measurements from a novel interferometer for EUVL mirror substrates

Absolute heterdyne interferometer for strongly aspherical mirrors

Lithografische spiegels meten met subnanonauwkeurigheid

Lithographic mirrors measured with sub-nanometre accuracy

Absolute interferometric surface profiling with 1 Å accuracy

Fast sampling multiplex detector for a hetrodyne interferometer with angstrom precision

CMOS translinear implementation of the lock-in pixel

Three-wavelength Laser Light source for absolute, sub-Angstrom, two point source interferometer

Characterization of the Frequency Modulated Continuous Wave Subsystem of an Angstrom Accuracy Absolute Interferometer

Absolute optical path difference measurement with angstrom accuracy over ranges of millimetres.

Measuring absolute optical path differences with angstrom accuracy over ranges of millimeters.