DK
D. Kolenov
11 records found
1
Coating layer on samples with roughness
Numerical study for coherent Fourier scatterometry
For the development of integrated circuits, the accompanying metrology inside the fabrication process is essential. Non-imaging metrology of nanostructure has to be quick and non-destructive. The multilayers are crucial components of today's microprocessor nanostructures and refl
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It has been a widely growing interest in using silicon carbide (SiC) in high-power electronic devices. Yet, SiC wafers may contain killer defects that could reduce fabrication yield and make the device fall into unexpected failures. To prevent these failures from happening, it is
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Coherent Fourier scatterometry
A holistic tool for inspection of isolated particles or defects on gratings
Detecting defects on diffraction gratings is crucial for ensuring their performance and reliability. Practical detection of these defects poses challenges due to their subtle nature.We performnumerical investigations and demonstrate experimentally the capability of coherent Fouri
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We demonstrate that the sensitivity of nanoparticle detection on surfaces can be substantially improved by implementing synthetic optical holography (SOH) in coherent Fourier scatterometry (CFS), resulting in a phase-sensitive confocal differential detection technique that operat
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The phenomenon of scattering is ubiquitous. The human eye sees it as a ``blue" sky in a summer morning or a diffuse glow during the night, the color of a laser or fog in the air. Alternatively, scattering recorded with a state-of-the-art instrument manifests itself in collisions
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Coherent Fourier scatterometry (CFS) has been introduced to fulfil the need for noninvasive and sensitive inspection of subwavelength nanoparticles in the far field. The technique is based on detecting the scattering of coherent light when it is focused on isolated nanoparticles.
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We present an efficient machine learning framework for detection and classification of nanoparticles on surfaces that are detected in the far-field with coherent Fourier scatterometry (CFS). We study silicon wafers contaminated with spherical polystyrene (PSL) nanoparticles (with
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The analysis of 2D scattering maps generated in scatterometry experiments for detection and classification of nanoparticles on surfaces is a cumbersome and slow process. Recently, deep learning techniques have been adopted to avoid manual feature extraction and classification in
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We report a novel method of focus determination with high sensitivity and submicrometre accuracy. The technique relies on the asymmetry in the scattered far field from a nanosphere located at the surface of interest. The out-of-focus displacement of the probing beam manifests its
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We demonstrate the far field detection of low-contrast nanoparticles on surfaces using a technique that is based on evanescent-wave amplification due to a thin dielectric layer that is deposited on the substrate. This research builds upon earlier results where scattering enhancem
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Coherent Fourier Scatterometry (CFS) is a scanning optical technique that is particularly suitable for nanoparticle detection. Inspection of wafer surfaces is one of the critical bottle-necks for high yield in the production of semiconductor chips. Ideally, inspection systems are
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