Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

HJ Voorma (TU Delft - QN/Fysics of NanoElectronics)

E Louis (External organisation)

NB Koster (External organisation)

LA Smaenok (External organisation)

F. Bijkerk (External organisation)

T Zijlstra (TU Delft - QN/Kavli Nanolab Delft)

LEM de Groot (TU Delft - QN/Kavli Nanolab Delft)

Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)

BAC Rousseeuw (TU Delft - QN/Kavli Nanolab Delft)

J Romijn (TU Delft - QN/Kavli Nanolab Delft)

J Friedrich (External organisation)