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Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

Journal article (1997)

Authors

HJ Voorma QN/Fysics of NanoElectronics
E Louis External organisation
NB Koster External organisation
LA Smaenok External organisation
F Bijkerk External organisation
T Zijlstra QN/Kavli Nanolab Delft
LEM de Groot QN/Kavli Nanolab Delft
EWJM van der Drift QN/Kavli Nanolab Delft
BAC Rousseeuw QN/Kavli Nanolab Delft
J Romijn QN/Kavli Nanolab Delft
J Friedrich External organisation
Research Group
QN/Fysics of NanoElectronics
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Published Date

1997

Language

Undefined/Unknown

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Research Group

QN/Fysics of NanoElectronics

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