Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

Journal article (1997)

Authors

HJ Voorma QN/Fysics of NanoElectronics
E Louis External organisation
J Friedrich External organisation
NB Koster External organisation
LA Smaenok External organisation
F Bijkerk External organisation
T Zijlstra QN/Kavli Nanolab Delft - AS
LEM de Groot QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
BAC Rousseeuw QN/Kavli Nanolab Delft - AS
J Romijn QN/Kavli Nanolab Delft - AS
Research Group
QN/Fysics of NanoElectronics
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Published Date

1997

Language

Undefined/Unknown

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Research Group

QN/Fysics of NanoElectronics