Pure boron chemical vapor deposited layers; A new material for silicon device processing

L. K. Nanver (TU Delft - Electronic Components, Technology and Materials)

T.L.M. Scholtes (TU Delft - Electronic Components, Technology and Materials)

F Sarubbi (TU Delft - Electronic Components, Technology and Materials)

WB De Boer (TU Delft - Electronic Components, Technology and Materials)

G Lorito (TU Delft - Electronic Components, Technology and Materials)

A. Sakic (TU Delft - Electronic Components, Technology and Materials)

S Milosavljević (TU Delft - Electronic Components, Technology and Materials)

C. Mok Kai Rine (TU Delft - Electronic Components, Technology and Materials)

L. Shi (TU Delft - Electronic Instrumentation)

S. Nihtianova (TU Delft - Electronic Instrumentation)

K. Buisman (TU Delft - Old - EWI Sect. Electronics)