Pure boron chemical vapor deposited layers; A new material for silicon device processing

L.K. Nanver (TU Delft - Electronic Components, Technology and Materials)

TLM Scholtes (TU Delft - Electronic Components, Technology and Materials)

F Sarubbi (TU Delft - Electronic Components, Technology and Materials)

W.B. de Boer (TU Delft - Electronic Components, Technology and Materials)

G Lorito (TU Delft - Electronic Components, Technology and Materials)

A Sakic (TU Delft - Electronic Components, Technology and Materials)

S. Milosavljevic (TU Delft - Electronic Components, Technology and Materials)

C Mok Kai Rine (TU Delft - Electronic Components, Technology and Materials)

L. Shi (TU Delft - Electronic Instrumentation)

Stoyan Nihtianova (TU Delft - Electronic Instrumentation)

K. Buisman (TU Delft - Old - EWI Sect. Electronics)