In the Multi beam source (MBS) of our Multi Beam Scanning Electron Microscope (MBSEM), an aperture lens array (ALA) splits the emission cone of the Schottky field emitter into multiple beamlets. When the apertures in the ALA are close to each other, the ALA can introduce aberrations to these beamlets through the electrostatic interaction of neighbouring apertures with each aperture's lens field. When the apertures are arranged in a square grid pattern, the aberration causes fourfold astigmatism. The effect on the beam spot is analyzed through a combination of 3D simulations and experimental validation. To counterbalance the fourfold astigmatism, a correction scheme is proposed in which a slightly non-round profile is applied to the aperture lenses.

The design of an electrostatic electron optical system with five electrodes and two objective functions is optimized using multiobjective genetic algorithms (MOGAs) optimization. The two objective functions considered are minimum probe size of the primary electron beam in a fixed image plane and maximum secondary electron detection efficiency at an in-lens detector plane. The time-consuming step is the calculation of the system potential. There are two methods to do this. The first is using COMSOL (finite element method) and the second is using the second-order electrode method (SOEM). The former makes the optimization process very slow but accurate, and the latter makes it fast but less accurate. A fully automated optimization strategy is presented, where a SOEM-based MOGA provides input systems for a COMSOL-based MOGA. This boosts the optimization process and reduces the optimization times by at least ∼10 times, from several days to a few hours. A typical optimized system has a probe size of 11.9 nm and a secondary electron detection efficiency of 80%. This new method can be implemented in electrostatic lens design with one or more objective functions and multiple free variables as a very efficient, fully automated optimization technique.

In electrostatic charged particle lens design, optimization of a multi-electrode lens with many free optimization parameters is still quite a challenge. A fully automated optimization routine is not yet available, mainly because the lens potential calculations are often done with very time-consuming methods that require meshing of the lens space. A new method is proposed that improves on the low speed of the potential calculation while keeping the high accuracy of the mesh-based calculation methods. This is done by first using a fast potential calculation based on the so-called Second-Order Electrode Method (SOEM), at the cost of losing some accuracy, and then using a Genetic Algorithm (GA) for the optimization. Then, by using the parameters of the approximate systems found from this optimization based on SOEM, an accurate GA optimization routine is performed based on potential calculation with the commercial finite element package COMSOL. A six-electrode electrostatic lens was optimized accurately within a few hours, using all lens dimensions and electrode voltages as free parameters and the focus position and maximum allowable electric fields between electrodes as constraints.

Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe₃ as a precursor gas, 14 × 14 arrays of Pt-containing dots were deposited on a W/Si ₃N₄/W membrane, with each array of 196 dots deposited in a single exposure. The authors demonstrate that by shifting the array of beams over distances of several times the beam pitch, one can deposit rows of closely spaced dots that, although originating from different beams within the array, are positioned within 5 nm of a straight line.