Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias

M Saadaoui (TU Delft - Electronic Components, Technology and Materials)

Henk W. van Zeijl (TU Delft - Electronic Components, Technology and Materials)

TMH Pham (TU Delft - Old - EWI Sect. ECTM)

HC MKnoops (External organisation)

WMM Kessels (External organisation)

MCM van de Sanden (External organisation)

F Roozeboom (External organisation)

Y Lamy (External organisation)

KB Jinesh (TU Delft - Electronic Components, Technology and Materials)

W. Besling (External organisation)

Lina Sarro (TU Delft - Electronic Components, Technology and Materials)