A. Ingenito
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Background: Elongated nanostructures, such as nanowires, have attracted significant attention for application in silicon-based solar cells. The high aspect ratio and characteristic radial junction configuration can lead to higher device performance, by increasing light absorption and, at the same time, improving the collection efficiency of photo-generated charge carriers. This work investigates the performance of ultra-thin solar cells characterised by nanowire arrays on a crystalline silicon bulk. Results: Proof-of-concept devices on a p-type mono-crystalline silicon wafer were manufactured and compared to flat references, showing improved absorption of light, while the final 11.8% (best-device) efficiency was hindered by sub-optimal passivation of the nanowire array. A modelling analysis of the optical performance of the proposed solar cell architecture was also carried out. Results showed that nanowires act as resonators, amplifying interference resonances and exciting additional wave-guided modes. The optimisation of the array geometrical dimensions highlighted a strong dependence of absorption on the nanowire cross section, a weaker effect of the nanowire height and good resilience for angles of incidence of light up to 60°. Conclusion: The presence of a nanowire array increases the optical performance of ultra-thin crystalline silicon solar cells in a wide range of illumination conditions, by exciting resonances inside the absorber layer. However, passivation of nanowires is critical to further improve the efficiency of such devices.
Black silicon (b-Si) nanotextures can significantly enhance the light absorption of crystalline silicon solar cells. Nevertheless, for a successful application of b-Si textures in industrially relevant solar cell architectures, it is imperative that charge-carrier recombination at particularly highly n-type doped black Si surfaces is further suppressed. In this work, this issue is addressed through systematically studying lowly and highly doped b-Si surfaces, which are passivated by atomic-layer-deposited Al2O3 films or SiO2/Al2O3 stacks. In lowly doped b-Si textures, a very low surface recombination prefactor of 16 fA/cm2 was found after surface passivation by Al2O3. The excellent passivation was achieved after a dedicated wet-chemical treatment prior to surface passivation, which removed structural defects which resided below the b-Si surface. On highly n-type doped b-Si, the SiO2/Al2O3 stacks result in a considerable improvement in surface passivation compared to the Al2O3 single layers. The atomic-layer-deposited SiO2/Al2O3 stacks therefore provide a low-temperature, industrially viable passivation method, enabling the application of highly n- type doped b-Si nanotextures in industrial silicon solar cells.
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Front and rear contacted wafer-based c-Si solar cells characterized by P-diffused emitter and Al-based back surface field currently constitute the dominant solar cell architecture in the photovoltaic market. The key success of this technology is based on the simple and cost effective fabrication process. However, its conversion efficiency is limited. High-efficiency c-Si solar cells architectures have been demonstrated at laboratory and industrial scale with the aim of decreasing the levelized cost of electricity (LCOE) by increasing efficiency. For this reason, high-efficiency solar cells are expected to increase their market share in next decade. In particular, interdigitated back contacted (IBC) c-Si solar cell architecture, which the current world record efficiency is based on, is expected to gain shortly relevance at industrial level. In this work, activities at TUDelft on the fabrication of IBC c-Si solar cells are reported. In particular, a novel method for realizing high-efficiency IBC c-Si solar cells based on single-side and (relatively) low-temperature doping techniques is demonstrated. In particular, epitaxial growth of B-doped Si is used to form the emitter, while P-ion implantation is deployed to form both front and back surface fields. To pattern the rear junction, a self-aligned process based on one lithographic step has been developed. In addition, metal lift-off is used to define the metal contacts of both polarities. By using this process, efficiency higher than 20% has been demonstrated.