Increasing demand for cryogenic electronics aimed at quantum sensors and computing technologies asks for accurate and quantifiable calibration methods and techniques. In this work, we present a structured approach to generate the nominal RF responses of standard artifacts, enabling wideband vector network analyzer (VNA) calibration algorithms, i.e., short, open, load, and reciprocal (SOLR), at cryogenic temperatures. Moreover, we present an EM simulation strategy to generate the perturbations in the artifacts’ responses based on mechanical fabrication tolerances and calculate an equivalent RF response uncertainty. Both the nominal and perturbed standard responses are computed at (user defined) cryogenic temperatures, by combining thermo-mechanical responses with the electromagnetic solver. A circuit simulator-based measurement model (MM) is used to compute the uncertainties of the cryogenic setups used in this work. Error contributions arising from the propagation of VNA noise, switch nonidealities, calibration artifacts uncertainties, temperature fluctuations, and temperature gradient over the interconnects are included in the MM. For validation, measured results of a coaxial air transmission line at 77 K and 4.2 K are presented and compared with 3-D EM simulation predictions. Finally, the measurement uncertainties are detailed in a budget analysis describing the individual contributions.

This work presents a structured, CAD-assisted design flow to realize broadband on-wafer calibration structures, validated in the prefabrication phase, and extract the intrinsic device response up to (sub)mm-waves. The strict requirements imposed by the design rule checks (DRCs) of 22 nm CMOS technology are incorporated during the design phase of the fixture by using a scripted connectable tile elements approach. The minimum dimension of a critical feature of the fixture is then identified using a newly defined metric based on the correspondence between the EM field distribution in the fixture versus a non-perturbed case of the same standard (STD) artifact. A simulation test bench environment, augmented with experimental data, is then used to add the uncertainties arising from three main error contributors: vector network analyzer (VNA) receiver noise, probe placement error, and calibration residual errors. Including these errors allows for the generation of pre-silicon numerical uncertainty bounds, which are benchmarked with experimental data using calibration quality metrics and device-level parameters. Measurement results ranging from 1 to 325 GHz are presented to demonstrate the validity of the proposed approach to establish the quality of on-wafer calibration approaches integrated in the back-end of line of Si-based technologies and to validate the compact model of CMOS devices up to (sub)mm-waves.

In this work, we present a numerical testbench, realized in a circuit simulation environment, enabling a priori uncertainty evaluation of dielectric spectroscopy in the application field of organs-on-chip. This testbench evaluates the impact of noise, ambient temperature variation and impurity of liquid standards on the uncertainty of dielectric spectroscopy measurements. Moreover, the proposed approach allows to account for the impact on measurement sensitivity of system parameters such as probe dimensions and probe coatings. The estimated uncertainty contributions for the considered effects are compared and benchmarked experimentally. Finally, the testbench is employed to project the dielectric spectroscopy accuracy on a relevant biological application, namely monitoring the growth of a 7 μm-thick kidney cell monolayer.

In this contribution, we describe the modeling approaches and the characterization procedures used to develop accurate standard models for cryogenic, probe-level, calibrations substrates.The key electrical and mechanical parameters of the impedance terminations and the lines used in commercially available impedance standard substrates are first characterized versus temperature. After, these component are simulated using 2.5D EM solvers including their mechanical variation when exposed to cryogenic temperatures, to extract their nominal response at 7 Kelvin. The quality of the resulting calibrations at cryogenic is evaluated first using independent CPW lines on the calibration substrates and then by measuring the response of a transformer-based resonator realized on a Si-based technology.Ambient temperature models are used as a comparison, to highlight the accuracy improvement that can be achieved employing optimized Cryo-EM based models.