Pattern shift is one of the main failures of micro-electronics. In this paper, the influence of plastic deformation values of micro-structures of IC packages on the pattern shift of metal lines is studied by maximum plastic strain theory using a certain 2D FEM model with different design parameters, "d", "w", "t_epo", "t_Teos", "t_glue" "sy_glue" and "sy_al". For different critical process steps, the final process temperature is acted as a representative parameter to analyze its impact. Furthermore, Response Surface Model (RSM) of plastic strains is established using any two design parameters. Results show that "w", "t_epo", "t_Teos", "t_glue" "sy_glue" and "sy_al" will have different influence on pattern shifting while "d" have little impact.@en

The passivation cracking of Micro-structures of IC packages is studied by maximum principal stress theory using a certain 2D FEM model with different design parameters, pitch of lines, width of line, thickness of epoxy, thickness of dielectric layer, thickness of glue, the glue material's yielding stress and Aluminium yielding stress (following as "d", "w", "t_epo", "t_Teos", "t_glue", "sy_glue"and "sy_al" respectively). For different critical process steps, the final process temperature is acted as a representative parameter to analyze its impact. Furthermore, Response Surface Model (RSM) of principal stress is established using any two design parameters. Results show that "d", "w", "t_epo", "sy_glue" and "sy_al" will have great influence on passivation cracking while "t_Teos" have a little impact.@en