## W.M.J.M. Coene

22 records found

1

## Authored

We demonstrate our beamline using a table-top HHG EUV source for lensless imaging application in reflection m ode. T he s ample r eflection fu nction is reconstructed using an auto-differentiation based ptychographic algorithm built on TensorFlow platform.

@enWe present a highly stable, easy-to-use HHG source delivering a record photon flux of >10^{11} photons/s at 69eV-75eV, being tunable to approx. 100eV which will be used for future photon-hungry applications.

We present a parameter retrieval method which incorporates prior knowledge about the object into ptychography. The proposed method is applied to two applications: (1) parameter retrieval of small particles from Fourier ptychographic dark field measurements; (2) parameter retri ...

High-harmonic generation (HHG) driven by ultrashort laser pulses is an established process for the generation of coherent extreme ultraviolet (XUV) to soft X-ray radiation, which has found widespread use in various applications [1]. In recent years photon-hungry applications s ...

We report on a method that allows microscopic image reconstruction from extreme-ultraviolet diffraction patterns without the need for object support constraints or other prior knowledge about the object structure. This is achieved by introducing additional diversity through ro ...

The imaging and inspection of extreme ultraviolet (EUV) masks is an important aspect of EUV lithography. The availability of actinic mask inspection tools able to generate highly resolved defect maps of defective EUV layouts is needed to ensure defect-free wafer prints. The te ...

We investigate the performance of ptychography with noisy data by analyzing the Cramér-Rao lower bound. The lower bound of ptychography is derived and numerically computed for both top-hat plane wave and structured illumination. The influence of Poisson noise on the ptychograp ...

Diffractive shearing interferometry (DSI) is a method that has recently been developed to perform lensless imaging using extreme ultraviolet radiation generated by high-harmonic generation. In this paper, we investigate the uniqueness of the DSI solution and the requirements f ...

EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the litho ...

Scatterometry is an important nonimaging and noncontact method for optical metrology. In scatterometry certain parameters of interest are determined by solving an inverse problem. This is done by minimizing a cost functional that quantifies the discrepancy among measured data ...

A noise-robust extension of iterative phase retrieval algorithms that does not need to assume a noise model is proposed. It works by adapting the intensity constraints using the reconstructed object. Using a proof-of-principle ptychographic experiment with visible light and a ...

In this article we combine the well-known Ptychographical Iterative Engine (PIE) with the Hybrid Input-Output (HIO) algorithm. The important insight is that the HIO feedback function should be kept strictly separate from the reconstructed object, which is done by introducing a ...