Monolithic, low-temperature fabrication of three-dimensional integrated circuits

Monolithic 3D-ICs with single grain Si thin film transistors

Thick single grain silicon formation with microsecond green laser crystallization

Single-grain germanium TFTs

Monolithic 3D-ICs with single grain Si thin film transistors

Monolithic 3-D integration of SRAM and image sensor using two layers of single-grain silicon

Excimer laser crystallization of thick a-Si for photodiode and solar cell applications

A three-dimensional phase-field simulation of pulsed laser induced epitaxial growth of silicon

Solar cells using lateral PIN photodiodes fabricated by low temperature single grain silicon

High performance single-grain Ge TFTs without seed substrate

Location- and orientation-controlled, large single grain silicon induced by pulsed excimer laser crystallization

Analog and digital output lateral photodiodes fabricated by µ-Czochralski process at low temperature

Stacking of Single-Grain Thin-Film Transistors

Integrated High Performance (100) and (110) Oriented Single-Grain Si TFTs without Seed Substrate

Single Grain Si TFTs for RF and 3D ICs

A three-dimensional phase-field simulation of pulsed laser induced epitaxial growth of silicon

Simulation and Experimental study of crystallographic orientation control of 2D location controlled single grain crystalline silicon

A study of the CMP effect on the quality of thin silicon films crystallized by using the ¿-Czochralski process

Monolithic 3D-ICs with Single Grain Si TFTs

Fabrication of three-dimensional inverters using the ¿-czochralski