Expanding Thermal Plasma Deposition of Hydrogenated Amorphous Silicon for Solar Cells

High-rate deposition of microcrystalline silicon with an expanding thermal plasma

Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma

Improvement of expanding thermal plasma amorphous silicon solar cell by means of substrate RF-biasing

On the reproducibility of a-Si:H deposited with an expanding thermal plasma

Hydrogen injection in ETP plasma jet for fast-deposition of high-quality a-Si:H

Simulations of buffer layers in a-Si:H thin film solar cells deposited with an expanding thermal plasma

Determining the material structure of microcrystalline silicon from Raman spectra

Integration of expanding thermal plasma deposited hydrogenated amorphous silicon in solar cells

Effect of buffer sayers on p-i-n- a-Si:H solar cells deposited at high rate utilising an expanding thermal plasma

High-rate microcrystalline silicon for solar cells