B.T. Buijtendorp
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11 records found
1
Based on a literature study we identified a-SiC:H and hydrogenated amor- phous silicon (a-Si:H) as potentially promising low-loss dielectrics. In order to find the origin of the mm-submm loss, and to define which materials we investi- gated in this PhD project, we characterized the dielectrics’ material properties at room temperature prior to performing the cryogenic loss measurements. We deposited a-SiC:H at a substrate temperature Tsub of 400◦C using plasma- enhanced chemical vapor deposition (PECVD), and we deposited the a-Si:H films at Tsub of 100◦C, 250◦C, and 350◦C. We characterized the films’ material properties using Fourier-transform infrared spectroscopy (FTIR), Raman spec- troscopy and ellipsometry. For the a-Si:H we determined the hydrogen content and the microstructure parameter from the FTIR data, the bond-angle disorder from the Raman data, and the void volume fraction from the ellipsometry data. For both the a-Si:H and the a-SiC:H we determined the band gap and optical refractive index from the ellipsometry data, and the infrared refractive index from the FTIR data. From the Raman spectra we observed that the a-SiC:H and the a-Si:H films were amorphous. Furthermore, we performed electron diffraction spectroscopy to determine the Si to C ratio of the a-SiC:H. For the a-Si:H we found that the all the material properties depend monotonically on Tsub. Additionally, we measured the cryogenic microwave loss of the a-Si:H films, but we found no correlation between the microwave loss and Tsub.
No cryogenic mm-submm and microwave loss data was available for a- SiC:H. We measured the low-power and cryogenic microwave loss of the a- SiC:H and found that the microwave loss tangent (tanδ ∼ 10−5) is compa- rable to the loss of a-Si:H. Furthermore, we measured the mm-submm loss in the range of 270–385 GHz using an on-chip Fabry-Pérot experiment. The observed mm-submm losss value of 1.2 × 10−4 at 350 GHz was significantly lower than what was reported for a-Si:H, which previously exhibited the low- est reported microwave and mm-subm wave loss values among the deposited dielectrics which are commonly used in superconducting ICs. Furthermore, we found that the mm-submm loss of the a-SiC:H increases monotonically with frequency. This was surprising in the framework of TLSs and led us to the hypothesis that another loss mechanism than TLSs might be dominant at mm- submm wavelengths. In addition to the low losses, the a-SiC:H was found to be beneficial thanks to its very low stress, lack of blisters, and the possibility to fabricate a membrane from the a-SiC:H on a c-Si wafer.
To study the origin of the frequency dependent mm-submm loss in the a- SiC:H, we extended the on-chip Fabry-Pérot experiment to the 270–600 GHz range by making use of a wideband leaky antenna. Additionally, we measured the complex dielectric constant of the a-SiC:H in the 3–100 THz range using Fourier-transform spectroscopy (FTS). We modeled the FTS data using the Maxwell-Helmholtz-Drude (MHD) dispersion model and obtained the complex dielectric constant in the 3-100 THz range. Finally, we modeled the combined on-chip loss data from the Fabry-Pérot experiments and the FTS data by fitting the MHD dispersion model in the frequency range of 0.27–100 THz. Our model demonstrates that the mm-submm loss in the a-SiC:H above 200 GHz can be explained by the absorption tail of vibrational modes which are located above 10 THz. These results pave the way for a thorough understanding of the mm-submm loss in deposited dielectrics.
The low losses of the a-SiC:H allow for integrated superconducting spec- trometers with a large frequency bandwidth and relatively high resolving pow- ers without sacrificing too much optical efficiency. This has led to the application of the a-SiC:H in the DESHIMA 2.0 filter bank, which has seen first light in 2023 at the ASTE telescope in the Atacama Desert. ...
Based on a literature study we identified a-SiC:H and hydrogenated amor- phous silicon (a-Si:H) as potentially promising low-loss dielectrics. In order to find the origin of the mm-submm loss, and to define which materials we investi- gated in this PhD project, we characterized the dielectrics’ material properties at room temperature prior to performing the cryogenic loss measurements. We deposited a-SiC:H at a substrate temperature Tsub of 400◦C using plasma- enhanced chemical vapor deposition (PECVD), and we deposited the a-Si:H films at Tsub of 100◦C, 250◦C, and 350◦C. We characterized the films’ material properties using Fourier-transform infrared spectroscopy (FTIR), Raman spec- troscopy and ellipsometry. For the a-Si:H we determined the hydrogen content and the microstructure parameter from the FTIR data, the bond-angle disorder from the Raman data, and the void volume fraction from the ellipsometry data. For both the a-Si:H and the a-SiC:H we determined the band gap and optical refractive index from the ellipsometry data, and the infrared refractive index from the FTIR data. From the Raman spectra we observed that the a-SiC:H and the a-Si:H films were amorphous. Furthermore, we performed electron diffraction spectroscopy to determine the Si to C ratio of the a-SiC:H. For the a-Si:H we found that the all the material properties depend monotonically on Tsub. Additionally, we measured the cryogenic microwave loss of the a-Si:H films, but we found no correlation between the microwave loss and Tsub.
No cryogenic mm-submm and microwave loss data was available for a- SiC:H. We measured the low-power and cryogenic microwave loss of the a- SiC:H and found that the microwave loss tangent (tanδ ∼ 10−5) is compa- rable to the loss of a-Si:H. Furthermore, we measured the mm-submm loss in the range of 270–385 GHz using an on-chip Fabry-Pérot experiment. The observed mm-submm losss value of 1.2 × 10−4 at 350 GHz was significantly lower than what was reported for a-Si:H, which previously exhibited the low- est reported microwave and mm-subm wave loss values among the deposited dielectrics which are commonly used in superconducting ICs. Furthermore, we found that the mm-submm loss of the a-SiC:H increases monotonically with frequency. This was surprising in the framework of TLSs and led us to the hypothesis that another loss mechanism than TLSs might be dominant at mm- submm wavelengths. In addition to the low losses, the a-SiC:H was found to be beneficial thanks to its very low stress, lack of blisters, and the possibility to fabricate a membrane from the a-SiC:H on a c-Si wafer.
To study the origin of the frequency dependent mm-submm loss in the a- SiC:H, we extended the on-chip Fabry-Pérot experiment to the 270–600 GHz range by making use of a wideband leaky antenna. Additionally, we measured the complex dielectric constant of the a-SiC:H in the 3–100 THz range using Fourier-transform spectroscopy (FTS). We modeled the FTS data using the Maxwell-Helmholtz-Drude (MHD) dispersion model and obtained the complex dielectric constant in the 3-100 THz range. Finally, we modeled the combined on-chip loss data from the Fabry-Pérot experiments and the FTS data by fitting the MHD dispersion model in the frequency range of 0.27–100 THz. Our model demonstrates that the mm-submm loss in the a-SiC:H above 200 GHz can be explained by the absorption tail of vibrational modes which are located above 10 THz. These results pave the way for a thorough understanding of the mm-submm loss in deposited dielectrics.
The low losses of the a-SiC:H allow for integrated superconducting spec- trometers with a large frequency bandwidth and relatively high resolving pow- ers without sacrificing too much optical efficiency. This has led to the application of the a-SiC:H in the DESHIMA 2.0 filter bank, which has seen first light in 2023 at the ASTE telescope in the Atacama Desert.
Low-loss deposited dielectrics are beneficial for the advancement of superconducting integrated circuits for astronomy. In the microwave band (approximately 1-10 GHz) the dielectric loss at cryogenic temperatures and low electric field strengths is dominated by two-level systems. However, the origin of the loss in the millimeter-submillimeter band (approximately 0.1-1 THz) is not understood. We measured the loss of hydrogenated-amorphous-SiC films in the 0.27-100-THz range using superconducting-microstrip resonators and Fourier-transform spectroscopy. The agreement between the loss data and a Maxwell-Helmholtz-Drude dispersion model suggests that vibrational modes above 10 THz dominate the loss in hydrogenated amorphous SiC above 200 GHz.
Geometry dependence of two-level-system noise and loss in a - Si C
H parallel-plate capacitors for superconducting microwave resonators
Parallel-plate capacitors (PPC) significantly reduce the size of superconducting microwave resonators, reducing the pixel pitch for arrays of single-photon energy-resolving kinetic inductance detectors (KIDs). The frequency noise of KIDs is typically limited by tunneling two-level systems (TLS), which originate from lattice defects in the dielectric materials required for PPCs. How the frequency noise level depends on the PPC's dimensions has not been experimentally addressed. We measure the frequency noise of 56 resonators with a-SiC:H PPCs, which cover a factor of 44 in PPC area and a factor of 4 in dielectric thickness. To support the noise analysis, we measure the resonators' TLS-induced power-dependent intrinsic loss and temperature-dependent resonance frequency shift. From the TLS models, we expect a geometry-independent microwave loss and resonance frequency shift, which is set by the TLS properties of the dielectric. However, we observe a thickness-dependent microwave loss and resonance frequency shift; this is explained by surface layers that limit the performance of PPC-based resonators. For a uniform dielectric, the frequency noise level should scale directly inversely with the PPC area and thickness. We observe that an increase in PPC size reduces the frequency noise, but the exact scaling is, in some cases, weaker than expected. Finally, we derive engineering guidelines for the design of KIDs based on PPC-based resonators.
Low-loss a-SiC
H for superconducting microstrip lines for (sub-)millimeter astronomy
DESHIMA 2.0
Development of an Integrated Superconducting Spectrometer for Science-Grade Astronomical Observations
Integrated superconducting spectrometer (ISS) technology will enable ultra-wideband, integral-field spectroscopy for (sub)millimeter-wave astronomy, in particular, for uncovering the dust-obscured cosmic star formation and galaxy evolution over cosmic time. Here, we present the development of DESHIMA 2.0, an ISS for ultra-wideband spectroscopy toward high-redshift galaxies. DESHIMA 2.0 is designed to observe the 220–440 GHz band in a single shot, corresponding to a redshift range of z = 3.3–7.6 for the ionized carbon emission ([C II] 158 μ m). The first-light experiment of DESHIMA 1.0, using the 332–377 GHz band, has shown an excellent agreement among the on-sky measurements, the laboratory measurements, and the design. As a successor to DESHIMA 1.0, we plan the commissioning and the scientific observation campaign of DESHIMA 2.0 on the ASTE 10-m telescope in 2023. Ongoing upgrades for the full octave-bandwidth system include the wideband 347-channel chip design and the wideband quasi-optical system. For efficient measurements, we also develop the observation strategy using the mechanical fast sky-position chopper and the sky-noise removal technique based on a novel data-scientific approach. In the paper, we show the recent status of the upgrades and the plans for the scientific observation campaign.
Superconducting circuit elements used in millimeter-submillimeter (mm-submm) astronomy would greatly benefit from deposited dielectrics with small dielectric loss and noise. This will enable the use of multilayer circuit elements and thereby increase the efficiency of mm-submm filters and allow for a miniaturization of microwave kinetic inductance detectors (MKIDs). Amorphous dielectrics introduce excess loss and noise compared with their crystalline counterparts, due to two-level system defects of unknown microscopic origin. We deposited hydrogenated amorphous silicon films using plasma-enhanced chemical vapor deposition, at substrate temperatures of 100°C, 250°C, and 350°C. The measured void volume fraction, hydrogen content, microstructure parameter, and bond-Angle disorder are negatively correlated with the substrate temperature. All three films have a loss tangent below 10-5 for a resonator energy of 105 photons, at 120 mK and 4 to 7 GHz. This makes these films promising for MKIDs and on-chip mm-submm filters.
Hydrogenated Amorphous Silicon Carbide
A Low-Loss Deposited Dielectric for Microwave to Submillimeter-Wave Superconducting Circuits
Low-loss deposited dielectrics will benefit superconducting devices such as integrated superconducting spectrometers, superconducting qubits, and kinetic inductance parametric amplifiers. Compared with planar structures, multilayer structures such as microstrips are more compact and eliminate radiation loss at high frequencies. Multilayer structures are most easily fabricated with deposited dielectrics, which typically exhibit higher dielectric loss than crystalline dielectrics. We measure the subkelvin and low-power microwave and millimeter-submillimeter-wave dielectric loss of hydrogenated amorphous silicon carbide (a-SiC:H), using superconducting chips with Nb-Ti-N/a-SiC:H/Nb-Ti-N microstrip resonators. We deposit the a-SiC:H by plasma-enhanced chemical vapor deposition at a substrate temperature of 400°C. The a-SiC:H has a millimeter-submillimeter loss tangent ranging from 0.9×10-4 at 270 GHz to 1.5×10-4 at 385 GHz. The microwave loss tangent is 3.1×10-5. These are the lowest low-power subkelvin loss tangents that have been reported for microstrip resonators at millimeter-submillimeter and microwave frequencies. The a-SiC:H films are free of blisters and have low stress: -20 MPa compressive at 200-nm thickness to 60 MPa tensile at 1000-nm thickness.
We present a lab-on-chip experiment to accurately measure losses of superconducting microstrip lines at microwave and submillimeter wavelengths. The microstrips are fabricated from Nb-Ti-N, which is deposited using reactive magnetron sputtering, and amorphous silicon which is deposited using plasma-enhanced chemical vapor deposition (PECVD). Submillimeter wave losses are measured using on-chip Fabry-Perot resonators (FPRs) operating around 350 GHz. Microwave losses are measured using shunted half-wave resonators with an identical geometry and fabricated on the same chip. We measure a loss tangent of the amorphous silicon at single-photon energies of tanδ=3.7±0.5×10-5 at approximately 6GHz and tanδ=2.1±0.1×10-4 at 350 GHz. These results represent very low losses for deposited dielectrics, but the submillimeter wave losses are significantly higher than the microwave losses, which cannot be understood using the standard two-level system loss model.
A superconducting microstrip half-wavelength resonator is proposed as a suitable band-pass filter for broadband moderate spectral resolution spectroscopy for terahertz (THz) astronomy. The proposed filter geometry has a free spectral range of an octave of bandwidth without introducing spurious resonances, reaches a high coupling efficiency in the pass-band and shows very high rejection in the stop-band to minimize reflections and cross-talk with other filters. A spectrally sparse prototype filter-bank in the band 300400 GHz has been developed employing these filters as well as an equivalent circuit model to anticipate systematic errors. The fabricated chip has been characterized in terms of frequency response, reporting an average peak coupling efficiency of 27% with an average spectral resolution of 940.