Resistive RAM (RRAM) is a promising technology to replace traditional technologies such as Flash, because of its low energy consumption, CMOS compatibility, and high density. Many companies are prototyping this technology to validate its potential. Bringing this technology to the market requires high-quality tests to ensure customer satisfaction. Hence, it is of great importance to deeply understand manufacturing defects and accurately model them to develop optimal tests. This paper presents a holistic framework for defect and fault modeling that enables the development of optimal tests for RRAMs. An overview and classification of RRAM manufacturing defects are provided. Defects in contacts and interconnects are modeled as resistors. Unique RRAM defects, e.g., forming defects, require Device-Aware defect modeling which incorporates the defect's impact on the device's electric properties by adjusting the affected technology and electrical parameters. Additionally, a systematic approach to define the fault space is presented, followed by a methodology to validate this space. With this methodology, accurate fault modeling for contact, interconnect, and forming defects is performed and tests are developed. The tests are able to detect all faults in a time-efficient manner, thereby proving the effectiveness of the framework. Finally, an outlook on future RRAM testing is presented.

STT-MRAM has long been a promising non-volatile memory solution for the embedded application space owing to its attractive characteristics such as non-volatility, low leakage, high endurance, and scalability. However, the operating requirements for high-performance computing (HPC) and low power (LP) applications involve different challenges. This paper addresses different aspects of STT-MRAM; it will cover state-of-the-art, some new results and future challenges related to technology, design and test. While STT-MRAM devices have shown encouraging performance metrics at device-level, a key challenge has been achieving backend-of-line (BEOL) CMOS compatibility, while retaining the benefits of low power operation. Scaling demands to improve data densities have placed additional challenges in terms of addressing the impact of process-induced damage on device performance at CD < 100 nm. In addition, the paper discusses the design of reliable read mechanism considering the variability effects. Moreover, the failure of traditional fault modeling and test approaches in model STT-MRAM unique defects for appropriate test solutions is demonstrated in this paper based on silicon data.

The manufacturing process of STT-MRAM requires unique steps to fabricate and integrate magnetic tunnel junction (MTJ) devices which are data-storing elements. Thus, understanding the defects in MTJs and their faulty behaviors are paramount for developing high-quality test solutions. This article applies the advanced device-aware test to intermediate (IM) state defects in MTJ devices based on silicon measurements and circuit simulations. An IM state manifests itself as an abnormal third resistive state, which differs from the two bi-stable states of MTJ. We performed silicon measurements on MTJ devices with diameter ranging from 60nm to 120nm; the results show that the occurrence probability of IM state strongly depends on the switching direction, device size, and bias voltage. We demonstrate that the conventional resistor-based fault modeling and test approach fails to appropriately model and test such a defect. Therefore, device-aware test is applied. We first physically model the defect and incorporate it into a Verilog-A MTJ compact model and calibrate it with silicon data. Thereafter, this model is used for a systematic fault analysis based on circuit simulations to obtain accurate and realistic faults in a pre-defined fault space. Our simulation results show that an IM state defect leads to intermittent write transition faults. Finally, we propose and implement a device-aware test solution to detect the IM state defect.

Understanding the manufacturing defects in magnetic tunnel junctions (MTJs), which are the data-storing elements in STT-MRAMs, and their resultant faulty behaviors are crucial for developing high-quality test solutions. This paper introduces a new type of MTJ defect: synthetic anti-ferromagnet flip (SAFF) defect, wherein the magnetization in both the hard layer and reference layer of MTJ devices undergoes an unintended flip to the opposite direction. Both magnetic and electrical measurement data of SAFF defect in fabricated MTJ devices is presented; it shows that such a defect reverses the polarity of stray field at the free layer of MTJ, while it has no electrical impact on the single isolated device. The paper also demonstrates that using the conventional fault modeling and test approach fails to appropriately model and test such a defect. Therefore device-Aware fault modeling and test approach is used. It first physically models the defect and incorporate it into a Verilog-A MTJ compact model, which is afterwards calibrated with silicon data. The model is thereafter used for fault analysis and modeling within an STT-MRAM array; simulation results show that a SAFF defect may lead to an intermittent Passive Neighborhood Pattern Sensitive Fault (PNPSF1i) when all neighboring cells are in logic '1' state. Finally, test solutions for such fault are discussed.

Emerging memristor-based architectures are promising for data-intensive applications as these can enhance the computation efficiency, solve the data transfer bottleneck and at the same time deliver high energy efficiency using their normally-off/instant-on attributes. However, their storing devices are more susceptible to manufacturing defects compared to the traditional memory technologies because they are fabricated with new materials and require different manufacturing processes. Hence, in order to ensure correct functionalities for these technologies, it is necessary to have accurate fault modeling as well as proper test methodologies with high test coverage. In this paper, we propose technology specific cell-level defect modeling, accurate fault analysis and yield improvement solutions for memristor-based memory as well as Computation-In-Memory (CIM) architectures. Our overall contributions cover three abstraction levels, namely, device, architecture and system. First, we propose a device-aware test methodology in which we have introduced a key device-level characteristic to develop accurate defect model. Second, we demonstrate a yield analysis framework for memristor arrays considering reliability and permanent faults due to parametric variations and explore fault-tolerant solutions. Third, a lightweight on-line test and repair schemes is proposed for emerging CIM devices in machine learning applications.

Manufacturing defects can cause faults in FinFET SRAMs. Of them, easy-to-detect (ETD) faults always cause incorrect behavior, and therefore are easily detected by applying sequences of write and read operations. However, hard-to-detect (HTD) faults may not cause incorrect behavior, only parametric deviations. Detection of these faults is of major importance as they may lead to test escapes. This paper proposes a new design-for-testability (DFT) scheme for FinFET SRAMs to detect such faults by creating a mismatch in the sense amplifier (SA). This mismatch, combined with the defect in the cell, will incorrectly bias the SA and cause incorrect read outputs. Furthermore, post-silicon calibration schemes can be used to avoid over-testing or test escapes caused by process variation effects. Compared to the state of the art, this scheme introduces negligible overheads in area and test time while it significantly improves fault coverage and reduces the number of test escapes.

STT-MRAM mass production is around the corner as major foundries worldwide invest heavily on its commercialization. To ensure high-quality STT-MRAM products, effective yet cost-efficient test solutions are of great importance. This article presents a systematic device-aware defect and fault modeling framework for STT-MRAM to derive accurate fault models which reflect the physical defects appropriately, and thereafter optimal and high-quality test solutions. An overview and classification of manufacturing defects in STT-MRAMs are provided with an emphasis on those related to the fabrication of magnetic tunnel junction (MTJ) devices, i.e., the data-storing elements. Defects in MTJ devices need to be modeled by adjusting the affected technology parameters and subsequent electrical parameters to fully capture the defect impact on both the device's electrical and magnetic properties, whereas defects in interconnects can be modeled as linear resistors. In addition, a complete single-cell fault space and nomenclature are defined, and a systematic fault analysis methodology is proposed. To demonstrate the use of the proposed framework, resistive defects in interconnect and pinhole defects in MTJ devices are analyzed for a single 1T-1MTJ memory cell. Test solutions for detecting these defects are also discussed.