Strained germanium ((Formula presented.) -Ge) and strained silicon ((Formula presented.) -Si) buried quantum wells have enabled advanced spin-qubit quantum processors. However, in the absence of suitable lattice-matched substrates, (Formula presented.) -Ge and (Formula presented.) -Si are deposited on defective, metamorphic SiGe buffers, which may impact device performance and scaling. Here an alternative platform is introduced based on the heterojunction between bulk unstrained Ge and a lattice-matched strained silicon-germanium ((Formula presented.) -SiGe) barrier, eliminating the need for metamorphic buffers altogether. In a structure with a 52-nm-thick (Formula presented.) -SiGe barrier, a low-disorder two-dimensional hole gas is demonstrated with a high-mobility of (Formula presented.) and a low percolation density of (Formula presented.). Quantum transport shows that holes confined in the buried unstrained Ge channel have a strong density-dependent in-plane effective mass and out-of-plane (Formula presented.) -factor, pointing to a significant heavy-hole–light-hole mixing in agreement with theory. Measurements of Zeeman-split levels in quantum point contacts further highlight this character, showing a two-fold larger in-plane (Formula presented.) -factor in Ge than in (Formula presented.) -Ge. The prospects of strong spin–orbit interaction, isotopic purification, and of hosting superconducting pairing correlations make this platform appealing for fast quantum hardware and hybrid quantum systems.

The rapidly growing number of qubits in semiconductor quantum computers requires a scalable control interface, including the efficient generation of dc bias voltages for gate electrodes. To avoid unrealistically complex wiring between any room-temperature electronics and the cryogenic qubits, this article presents an integrated cryogenic solution for the bias-voltage generation and distribution for large-scale semiconductor spin-qubit quantum processors. A dedicated cryogenic CMOS (cryo-CMOS) demultiplexer and a cryo-CMOS dc digital-to-analog converter (DAC) have been developed in a 22-nm fin field-effect transistor process to control a codeveloped 2-D array designed with 648 single-hole transistors. Thanks to the dissipation below 120 µ W, the whole system operates at temperatures below 70 mK in a custom-built electrical/mechanical infrastructure embedded in a standard single-pulse-tube dilution refrigerator. The bias voltages generated by the cryo-CMOS DAC are demultiplexed to sample-and-hold structures, allowing to store 96 unique bias voltages over a 3 V range with a voltage drift between 60 µ V / s and 18 mV/s. This work demonstrates a tight integration at mK temperatures of cryo-CMOS bias generation and distribution with a dedicated large-scale quantum device. This showcases how this approach simplifies the wiring to the electronics, thus facilitating the scaling up of quantum processors toward the large number of qubits required for a practical quantum computer.

We grow strained Ge/SiGe heterostructures by reduced-pressure chemical vapor deposition on 100 mm Ge wafers. The use of Ge wafers as substrates for epitaxy enables high-quality Ge-rich SiGe strain-relaxed buffers with a threading dislocation density of ( 6 ± 1 ) × 10 5 cm − 2 , nearly an order of magnitude improvement compared to control strain-relaxed buffers on Si wafers. The associated reduction in short-range scattering allows for a drastic improvement of the disorder properties of the two-dimensional hole gas, measured in several Ge/SiGe heterostructure field-effect transistors. We measure an average low percolation density of ( 1.22 ± 0.03 ) × 10 10 cm − 2 and an average maximum mobility of ( 3.4 ± 0.1 ) × 10 6 cm 2 / Vs and quantum mobility of ( 8.4 ± 0.5 ) × 10 4 cm 2 / Vs when the hole density in the quantum well is saturated to ( 1.65 ± 0.02 ) × 10 11 cm − 2 . We anticipate immediate application of these heterostructures for next-generation, higher-performance Ge spin-qubits, and their integration into larger quantum processors.

The co-integration of spin, superconducting, and topological systems is emerging as an exciting pathway for scalable and high-fidelity quantum information technology. High-mobility planar germanium is a front-runner semiconductor for building quantum processors with spin-qubits, but progress with hybrid superconductor-semiconductor devices is hindered by the difficulty in obtaining a superconducting hard gap, that is, a gap free of subgap states. Here, we address this challenge by developing a low-disorder, oxide-free interface between high-mobility planar germanium and a germanosilicide parent superconductor. This superconducting contact is formed by the thermally-activated solid phase reaction between a metal, platinum, and the Ge/SiGe semiconductor heterostructure. Electrical characterization reveals near-unity transparency in Josephson junctions and, importantly, a hard induced superconducting gap in quantum point contacts. Furthermore, we demonstrate phase control of a Josephson junction and study transport in a gated two-dimensional superconductor-semiconductor array towards scalable architectures. These results expand the quantum technology toolbox in germanium and provide new avenues for exploring monolithic superconductor-semiconductor quantum circuits towards scalable quantum information processing.

A hole bilayer in a strained germanium double quantum well is designed, fabricated, and studied. Magnetotransport characterization of double quantum well field-effect transistors as a function of gate voltage reveals the population of two hole channels with a high combined mobility of (Formula presented.) and a low percolation density of (Formula presented.). The individual population of the channels from the interference patterns of the Landau fan diagram was resolved. At a density of (Formula presented.) the system is in resonance and an anti-crossing of the first two bilayer subbands is observed and a symmetric-antisymmetric gap of (Formula presented.) is estimated, in agreement with Schrödinger-Poisson simulations.

We demonstrate that a lightly strained germanium channel (ϵ / / = - 0.41 %) in an undoped Ge/Si0.1Ge0.9 heterostructure field effect transistor supports a two-dimensional (2D) hole gas with mobility in excess of 1 × 10 6 cm2/Vs and percolation density less than 5 × 10 10 cm-2. This low disorder 2D hole system shows tunable fractional quantum Hall effects at low densities and low magnetic fields. The low-disorder and small effective mass (0.068 m e) defines lightly strained germanium as a basis to tune the strength of the spin-orbit coupling for fast and coherent quantum hardware.