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CMA Ashruf
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20 records found
Despite the many product development techniques available today, manufacturers under pressure to reduce time to market while keeping up with stricter regulatory demands are struggling more than ever with their product development processes. Here, I list a selection of problems an
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Conventional spin-coating methods for photoresist deposition give poor results for MEMS and other applications where a conformal resist layer is required over wafer surfaces with large topography.We have developed a coating tool for use with electro-depositable resist that gives
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Conventional spin-coating methods for photoresist deposition give poor results for MEMS and other applications where a conformal resist layer is required over wafer surfaces with large topography.We have developed a coating tool for use with electro-depositable resist that gives
...
Conventional spin-coating methods for photoresist deposition give poor results for MEMS and other applications where a conformal resist layer is required over wafer surfaces with large topography.We have developed a coating tool for use with electro-depositable resist that gives
...
Conventional spin-coating methods for photoresist deposition give poor results for MEMS and other applications where a conformal resist layer is required over wafer surfaces with large topography.We have developed a coating tool for use with electro-depositable resist that gives
...
Conventional spin-coating methods for photoresist deposition give poor results for MEMS and other applications where a conformal resist layer is required over wafer surfaces with large topography.We have developed a coating tool for use with electro-depositable resist that gives
...
Conventional spin-coating methods for photoresist deposition give poor results for MEMS and other applications where a conformal resist layer is required over wafer surfaces with large topography.We have developed a coating tool for use with electro-depositable resist that gives
...